Optimising ESD countermeasures in 12nm gate oxide semiconductor manufacturing: a robust engineering approach

Ahmad, Khairol Amali and Abd Ghani, Nabilah Fathiah and Mohamad Shahimin, Mukhzeer (2021) Optimising ESD countermeasures in 12nm gate oxide semiconductor manufacturing: a robust engineering approach. In: The 3rd International Conference on Applied Photonics and Electronics (InCAPE 2021, 6-7 Oktober 2021, via virtual conference. (Submitted)

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Abstract

Equipment inefficiency and ineffectiveness affect output performance/quality of production. Case study of this work 12 nm Gate Oxide Semiconductor Manufacturing, focusing at the back end process of IC fabrication.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: robust engineering,ESD, hypothesis
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Engineering
Depositing User: Mr Shahrim Daud
Date Deposited: 03 Apr 2023 04:14
Last Modified: 03 Apr 2023 04:14
URI: http://ir.upnm.edu.my/id/eprint/188

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